In addition to the excellent physical properties that ion beam sputtering yields, there is another major benefit; control . Ion beam sputtering deposits material directly on the substrate, as opposed to filling a vacuum chamber with vapor. This removes a control variable, as there is no lag time between material heating (evaporation) and deposition. Since the beam is electric, it is very controllable. The process is automated and we can deposit films in excess of 100 layers. These factors allow us to deposit the films that we design with high precision.
Second to IBS is ion-assisted deposition (IAD). This technology uses an ion beam to accelerate a vaporized material onto the substrate. While not as precise as IBS, this process has one advantage: it can be used for a wider breadth of materials. For this reason, ATFilms is in the process of adding this capability as a compliment to our IBS systems.
ATFilms has access to a vast array of test and metrology equipment through its affiliation with the Colorado Advanced Photonics Technology Center.
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